Chromium Tube Target for Vacuum Deposition

Our concentrate on is always to consolidate and enhance the excellent and service of present solutions, in the meantime regularly develop new products to meet distinctive customers' demands for Zirconium 702 Wire, Zirconium Tube, Titanium Plate. We organize our work carefully, plan scientifically, and constantly explore and master the objective laws of harmonious and stable development of the enterprise. Our R&D team always adheres to the concept and principle of "personalized" design to ensure high quality products to meet the core needs of our customers.

Titanium tube target made of titanium element Symbol Ti, atomic number 22, density 4.454g/Cm3, physical properties: melting point 1668C℃, boiling point 3262° C, specific heat capacity 0.52 (J/(Kg·K), evaporation heat 421 (KJ/Mol), melting heat 15.45(KJ/Mol),  Conductivity 0.0234(106/Cm).  

Due to the high cost of high purity titanium, the application field of titanium tube target is extremely limited, mainly used as semiconductor materials and suction materials in ultra-high vacuum devices.  

High purity titanium has the ability to absorb hydrogen, CH4 and Co2 gases, so it can be widely used in high vacuum and ultra-high vacuum systems.  When making LSI, VLSI and ULSI circuit network by sputtering the high purity titanium produced by Zhongkano can make these integrated parts extremely light, thin, small size and dense circuit.  High purity titanium tube targets can also be used as barrier metal materials.  

As our Chromium Tube Target for Vacuum Deposition adopts leading-edge technologies and successful marketing approaches, we are now ahead of the competition in the industry. On the basis of actively participating in international competition, we constantly grasp the pulse of market development, seek economic strategic alliances, and develop and progress together with global partners. Through marketing innovation, our company has gained greater market benefits.

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